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She is in charge of the whole manufacturing chain of these micro-devices, after definition with the applicant. The main steps in the manufacturing of an impression are :
- shaping of the mask representing the circuit
- deposition of the photosensitive resin on a 3" silicon plate
- UV exposure and revelation of the circuit imprint
This step can be done in two ways: exposure through a mask, or direct laser writing, using a device purchased in 2019 (Dilase by Kloé) and if the applicant wants a finished product...
- molding of PDMS on this impression
- gluing on glass slide
- installation of the fluidic connection
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Below is an example of a SU8 mold before molding with PDMS resin (SU8 thickness of 140microns)
Contact
Scientific Manager
Gwennou COUPIER
Office 309
Tel: 04 76 51 47 63
gwennou.coupieruniv-grenoble-alpes.fr (gwennou[dot]coupier[at]univ-grenoble-alpes[dot]fr)
Deputy Scientific Manager
Philippe MARMOTTANT
Office 330
Tel: 04 76 51 43 33
philippe.marmottantuniv-grenoble-alpes.fr (philippe[dot]marmottant[at]univ-grenoble-alpes[dot]fr)
Technical Team
Direct photolithography development
Mathilde VAN MELLE-GATEAU
Office 303
Tel: 04 76 63 58 71
mathilde.gateauuniv-grenoble-alpes.fr (mathilde[dot]gateau[at]univ-grenoble-alpes[dot]fr)
Technical manager
Danièle CENTANNI
Office 201
Tel: 04 76 51 47 66
daniele.centanniuniv-grenoble-alpes.fr (daniele[dot]centanni[at]univ-grenoble-alpes[dot]fr)
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